EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL)- The next generation lithography
Moore's Law In the last few decades, the semiconductor industries had followed Moore’s law; the number of transistors per chip had been doubling each process generation. Figure 1 shows the logic transistor density over the last decade and the future trend using a quantity density metric. The linear scale implies a doubling of density every 2 years. Intel has announced the new 10-nm process that achieves 100.8 million transistors per square millimeter. This provides a notable 2.7 times transistor density improvement over its predecessor and suggests that Moore’s law is likely not slowing down. This enhancement of transistor density has been done by shrinking the sizes of the transistors. EXTREME ULTRA-VIOLET LITHOGRAPHY (EUVL) Due to wavelength limitations, current attention is directed toward developing EUVL which uses extreme ultraviolet radiation to increase efficiency, reduces manufacturing cost, and supports the development of processing power. In the last decade, ...